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Hitachi Micro Device & Solution

Hitachi

analog custom IC

Flexible production can be supported as an Integrated device manufacturer.

  • Affluent design experience of BiCMOS technologies
  • Device and circuits development with hitachi Lab's
  • Realize better performance by adopting suitable device
  • ISO9001, ISO14001 compliant

Device Lineup


Technology Device fT Voltage Wafer Status
0.35µm Si BiCMOS 20GHz 3.3V SOI MP
13GHz 7V
0.25µm SiGe BiCMOS 15GHz 10V SOI MP
65GHz 3.5V
90GHz 2.5V
137GHz 2.0V
0.18µm SiGe BiCMOS 137GHz 2.0V Bulk MP
210GHz 1.5V
300GHz T.B.D UD

SOI : Silicon On Insulator , MP : Mass Production ,  UD : Under Development

Examples of Custom IC Products


Products Function, Applications Features Device
Mux IC (39.8Gbps - 43Gbps)
Dmux IC (39.8Gbps - 43Gbps)
2.5Gbps x 16ch
                    ⇔ 40Gbps
On chip
VCO
15GHz-
     210GHz
Low noise
SiGeBiCMOS
1chip Mux/Dmux IC (10Gbps) 640Mbps x 16ch
                    ⇔ 10Gbps
1chip integration
Transimpedance AMP Opt-Electric Transform >9.5GHz
High speed Gain AMP Opt-Electric Transform 9GHz
30dB ∼ -6dB
High speed Pin electronics AMP Semiconductor measurement equipment Low noise
High voltage
High precision DAC Reference voltage Multi channel Low noise BiCMOS
Sensor IF AMP (X-ray detect) Medical Inspection equipments Low noise
Sensor IF AMP
(Electrical Magnetic force detect)
Storage system Low noise

Example of 40Gbps Mux IC

Example of 40Gbps  Mux IC

  • 16 : 1 multiplexer
  • Full rate on chip VCO(39.8 - 43GHz)
  • On chip Phase compensation & decision circuits
  • Multistage FIFO with Over flow alarm
  • Temperature monitor

Example of transimpedance amplifier

Example of transimpedance amplifier

  • Receive AMP for Optical communication system
  • Device : 0.25µm SiGe BiCMOS
  • Trans-impedance : 1.2kΩ
  • Input converted Noise : 10pA/√Hz

Development flow & Support

1. Custom IC Development flow
    Hitachi provides cordial service to satisfy
    the customer's demand.
Custom IC Development flow

2. Support System
    Hitachi supports customer in every
    aspect of IC development.

 1) LSI package analysis
 2) LSI device analysis
     • Analysis of fault detection
     • Analysis of ultra-thin layer structure
     • Analysis of surface chemical bond
 3) FIB (*) metal correction
 4) Local area grinder to expose the defect
     layer

LSI device analysis

(*)FIB:Focused Ion Beam

*
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